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Recuperação de sílica-gel utilizando processos oxidativos avançados: uma alternativa simples e de baixo custo
| Content Provider | Scilit |
|---|---|
| Author | Teixeira, Silvio César Godinho Mathias, Leda Canela, Maria Cristina |
| Copyright Year | 2003 |
| Description | Silica gel is widely used as adsorbent for isolating and purifying natural compounds. Intensive use and high cost make this process expensive and generate solid residues contaminated with many different organic compounds. In the present work a simple method for recycling silica was investigated, by using Advanced Oxidative Processes. Silica gel was treated with H2O2/solar light and compared with a sample treated by conventional methods (high temperature and oxidation with KMnO4). High temperature treatment changes the structure of the silica and, consequently, the separation efficiency. Oxidation by using KMnO4 requires multiple steps and produces residues, including manganese and oxalic acid. The method using H2O2/solar light to recuperate silica gel does not modify its separation efficiency and is less expensive than the traditional methods. Additionally, HPLC and GC-MS analysis indicate that H2O2/solar light eliminates all residues of the silica gel |
| Related Links | http://www.scielo.br/scielo.php?script=sci_pdf&pid=S0100-40422003000600025&lng=pt&nrm=iso&tlng=pt |
| Ending Page | 933 |
| Page Count | 3 |
| Starting Page | 931 |
| ISSN | 01004042 |
| e-ISSN | 01004042 |
| DOI | 10.1590/s0100-40422003000600025 |
| Journal | Química Nova |
| Issue Number | 6 |
| Volume Number | 26 |
| Language | English |
| Publisher | FapUNIFESP (SciELO) |
| Publisher Date | 2003-12-01 |
| Access Restriction | Open |
| Subject Keyword | Química Nova Slica Gel Processos Oxidativos Gel Utilizando Oxidativos Avanados |
| Content Type | Text |
| Resource Type | Article |
| Subject | Chemistry |
