Effect of topological patterning on self-rolling of nanomembranes

Content Provider	Scilit
Author	Chen, Cheng Song, Pengfei Meng, Fanchao Ou, Pengfei Liu, Xinyu Song, Jun
Copyright Year	2018
Description	Journal: Nanotechnology The effects of topological patterning (i.e., grating and rectangular patterns) on the self-rolling behaviors of heteroepitaxial strained nanomembranes have been systematically studied. An analytical modeling framework, validated through finite-element simulations, has been formulated to predict the resultant curvature of the patterned nanomembrane as the pattern thickness and density vary. The effectiveness of the grating pattern in regulating the rolling direction of the nanomembrane has been demonstrated and quantitatively assessed. Further to the rolling of nanomembranes, a route to achieve predictive design of helical structures has been proposed and showcased. The present study provides new knowledge and mechanistic guidance towards predictive control and tuning of roll-up nanostructures via topological patterning.
Related Links	http://iopscience.iop.org/article/10.1088/1361-6528/aac8fe/pdf
ISSN	09574484
e-ISSN	13616528
DOI	10.1088/1361-6528/aac8fe
Journal	Nanotechnology
Issue Number	34
Volume Number	29
Language	English
Publisher	IOP Publishing
Publisher Date	2018-05-31
Access Restriction	Open
Subject Keyword	Journal: Nanotechnology Topological Patterning Helical Structures Strained Nanomembranes
Content Type	Text
Resource Type	Article
Subject	Chemistry Nanoscience and Nanotechnology Mechanics of Materials Mechanical Engineering Bioengineering Electrical and Electronic Engineering