NDLI: Approaching the Ni percolation threshold by thin-film irradiation

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Approaching the Ni percolation threshold by thin-film irradiation

Content Provider	Scilit
Author	Aprili, M. Nédellec, P.
Copyright Year	1997
Description	Journal: Journal of Physics: Condensed Matter We have reproduced a percolating structure in thin Ni films by an inhomogeneous sputtering process. The morphological disorder has been studied using TEM and ` in situ' transport measurements during ion irradiation. The fluence dependence of the resistance shows a singularity following a 2D percolation law. The formation of the hole structure is consistent with a Poisson mechanism. A computer simulation developed using a code based on a Poisson statistics allows us to account for the experimental values of the percolation threshold and the overall shape of the infinite cluster.
Related Links	http://iopscience.iop.org/article/10.1088/0953-8984/9/14/014/pdf
Ending Page	3009
Page Count	11
Starting Page	2999
ISSN	09538984
e-ISSN	1361648X
DOI	10.1088/0953-8984/9/14/014
Journal	Journal of Physics: Condensed Matter
Issue Number	14
Volume Number	9
Language	English
Publisher	IOP Publishing
Publisher Date	1997-04-07
Access Restriction	Open
Subject Keyword	Journal: Journal of Physics: Condensed Matter Metallurgy and Metallurgical Engineering Condensed Matter Physics Thin Film Percolation Threshold Computer Simulation
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Materials Science

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