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Mechanical variation of plasma potential, electron temperature and plasma density
| Content Provider | Scilit |
|---|---|
| Author | Hershkowitz, N. Cho, Moo-Hyun Pruski, J. |
| Copyright Year | 1992 |
| Description | Journal: Plasma Sources Science and Technology It is shown that the plasma potential and electron temperature of capacitively coupled RF plasmas, confined in a multi-dipole plasma device, can be varied by changing the position of a grounded plate located in the surface multi-dipole magnetic field. |
| Related Links | http://iopscience.iop.org/article/10.1088/0963-0252/1/2/003/pdf |
| Ending Page | 93 |
| Page Count | 7 |
| Starting Page | 87 |
| ISSN | 09630252 |
| e-ISSN | 13616595 |
| DOI | 10.1088/0963-0252/1/2/003 |
| Journal | Plasma Sources Science and Technology |
| Issue Number | 2 |
| Volume Number | 1 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 1992-05-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Plasma Sources Science and Technology Electron Temperature |
| Content Type | Text |
| Resource Type | Article |
| Subject | Condensed Matter Physics |