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Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit
| Content Provider | Scilit |
|---|---|
| Author | Sidelev, Dmitrii Yuryeva, A. V. Krivobokov, Valery Shabunin, A. S. Syrtanov, M. S. Koishybayeva, Z. |
| Copyright Year | 2016 |
| Description | Journal: Journal of Physics: Conference Series This article reports on technological possibilities of magnetron sputtering systems with solid-state and liquid-phase targets to deposition of aluminum films and its structure. The comparison of deposition rates of magnetron sputtering systems with direct current (DC), midfrequency (MF) and high power pulsed (HiPIMS) supplies is shown. The optical emission spectroscopy indicates a high component of target material ions in discharge gap only to HiPIMS technique. Al films are a (111)-line oriented in DC and MF power supply cases, for high power pulsed unit - aluminum films also have intense (220)-line. The dependence of grain sizes and sputtering technique parameters is obtained. |
| Related Links | https://iopscience.iop.org/article/10.1088/1742-6596/741/1/012193/pdf http://iopscience.iop.org/article/10.1088/1742-6596/741/1/012193/pdf |
| ISSN | 17426588 |
| e-ISSN | 17426596 |
| DOI | 10.1088/1742-6596/741/1/012193 |
| Journal | Journal of Physics: Conference Series |
| Issue Number | 1 |
| Volume Number | 741 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2016-08-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Journal of Physics: Conference Series Coatings and Films Aluminum Films Power Pulsed Magnetron Sputtering Systems Pulsed Unit |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy |
