NDLI: Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol–water mixtures: an EPR-spin trapping study

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Free radical generation by non-equilibrium atmospheric pressure plasma in alcohol–water mixtures: an EPR-spin trapping study

Content Provider	Scilit
Author	Uchiyama, Hidefumi Ishikawa, Kenji Zhao, Qing-Li Andocs, Gabor Nojima, Nobuyuki Takeda, Keigo Krishna, Murali C. Ishijima, Tatsuo Matsuya, Yuji Hori, Masaru Noguchi, Kyo Kondo, Takashi
Copyright Year	2018
Description	Journal: Journal of Physics D: Applied Physics Free radical species in aqueous solution - various alcohol-water reaction mixtures – by exposure to non-equilibrium cold atmospheric pressure Ar plasma (CAP), were monitored using electron paramagnetic resonance (EPR) spin-trapping techniques with 3, 5-dibromo-4-nitrosobenzene sulfonate (DBNBS) as a water soluble nitroso spin trap. The major radical species were formed by H-abstraction from alcohol molecules due to •OH radicals. In the ethanol-water mixture •CH2CH2OH produced by H abstraction from CH3 group of the ethanol and •CH3 radicals were detected. The latter was due to the decomposition of unstable CH3•CHOH to form the •CH3 radicals and the stable formaldehyde by C-C bond fission. These intermediates are similar to those observed by reaction with •OH radicals generation in the H2O2-UV photolysis of the reaction mixtures. The evidence of •CH3 radical formation in the pyrolytic decomposition of the reaction mixtures by exposure to ultrasound or in methane irradiated with microwave plasma have been reported previously. However, the pyrolytic •CH3 radicals were not found in both plasma and H2O2-UV photolysis condition. These results suggests that free radicals produced by Ar-CAP are most likely due to the reaction between abundant •OH radicals and alcohol molecules.
Related Links	http://iopscience.iop.org/article/10.1088/1361-6463/aaa885/pdf
ISSN	00223727
e-ISSN	13616463
DOI	10.1088/1361-6463/aaa885
Journal	Journal of Physics D: Applied Physics
Issue Number	9
Volume Number	51
Language	English
Publisher	IOP Publishing
Publisher Date	2018-01-17
Access Restriction	Open
Subject Keyword	Journal: Journal of Physics D: Applied Physics Atomic, Molecular and Chemical Physics Free Radical
Content Type	Text
Resource Type	Article
Subject	Surfaces, Coatings and Films Acoustics and Ultrasonics Condensed Matter Physics Electronic, Optical and Magnetic Materials

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