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Reduction of the Far-Field Divergence Angle of an 850 nm Multi-Leaf Holey Vertical Cavity Surface Emitting Laser
| Content Provider | Scilit |
|---|---|
| Author | Zhou, Kang Xu, Chen Xie, Yi-Yang Zhao, Zhen-Bo Liu, Fa Shen, Guang-Di |
| Copyright Year | 2011 |
| Description | Journal: Chinese Physics Letters By introducing multi-leaf sectorial holes into an oxidation confined 850 nm vertical cavity surface emitting laser (VCSEL), the far-field divergence angle is reduced. The finite-difference time-domain method is used to simulate the far-field pattern of the multi-leaf holey VCSEL with different etching depths and different shapes of the oxide aperture in diameter R. Based on the simulation result, we design and fabricate a multi-leaf holey VCSEL and its divergence angle is only 6°. The experimental results agree well with the theoretical predication. |
| Related Links | http://iopscience.iop.org/article/10.1088/0256-307X/28/8/084209/pdf |
| ISSN | 0256307X |
| e-ISSN | 17413540 |
| DOI | 10.1088/0256-307x/28/8/084209 |
| Journal | Chinese Physics Letters |
| Issue Number | 8 |
| Volume Number | 28 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2011-08-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Chinese Physics Letters Quantum Science and Technology Multi Leaf Holey Divergence Angle |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy |