NDLI: Nanopatterning by ion beam sputtering in unconventional formats

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Nanopatterning by ion beam sputtering in unconventional formats

Content Provider	Scilit
Author	Kim, Ji-Hyun Yoon, Sun Mi Jo, Sujin Seo, Jikeun
Copyright Year	2018
Description	Journal: Journal of Physics: Condensed Matter Nanopatterning at solid surfaces by ion-beam-sputtering (IBS) has been practiced mostly for stationary sub- strates with an ion beam incident under a fixed sputter geometry. We have released such constraints in the sputter condition. We simultaneously apply two ion beams or sequentially vary the orientation of substrate with respect to an ion beam. We also periodically change either the azimuthal or polar angle of the substrate with respect to an ion beam during IBS. Those unconventional ways of IBS can improve the order of the pattern, and produce novel and non trivial nano patterns that well serve as touch stones to refine the theoretical models and thus deepen our understanding of the patterning mechanisms by IBS.
Related Links	http://iopscience.iop.org/article/10.1088/1361-648X/aac7d7/pdf
ISSN	09538984
e-ISSN	1361648X
DOI	10.1088/1361-648x/aac7d7
Journal	Journal of Physics: Condensed Matter
Issue Number	27
Volume Number	30
Language	English
Publisher	IOP Publishing
Publisher Date	2018-05-25
Access Restriction	Open
Subject Keyword	Journal: Journal of Physics: Condensed Matter Dual Ion Beam Sputtering Rocking During Ion Beam Sputtering Sequential Ion Beam Sputtering Swing During Ion Beam Sputtering
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Materials Science

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