NDLI: Very high-frequency capacitively coupled argon discharges

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Very high-frequency capacitively coupled argon discharges

Content Provider	Scilit
Author	Colgan, M. J. Meyyappan, M. Murnick, D. E.
Copyright Year	1994
Description	Journal: Plasma Sources Science and Technology The effects of frequency variation in a high-frequency (13.6-54.4 MHz), low-pressure (250 mTorr), capacitively coupled argon discharge have been investigated. Spatially resolved optical emission and RF voltage and current measurements are reported. Results of fluid model simulations are also presented to aid in the interpretation of the experiments. Scaling of plasma parameters is studied under three conditions: constant frequency, constant applied voltage and constant current. The scaling laws derived here suggest ways to optimize a very high-frequency plasma reactor for thin film etching and deposition applications.
Related Links	http://iopscience.iop.org/article/10.1088/0963-0252/3/2/009/pdf
Ending Page	189
Page Count	9
Starting Page	181
ISSN	09630252
e-ISSN	13616595
DOI	10.1088/0963-0252/3/2/009
Journal	Plasma Sources Science and Technology
Issue Number	2
Volume Number	3
Language	English
Publisher	IOP Publishing
Publisher Date	1994-05-01
Access Restriction	Open
Subject Keyword	Journal: Plasma Sources Science and Technology Applied Physics Fluid Model High Frequency Low Pressure Thin Film
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics

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