NDLI: Transparent and p-type conductive $Ni_{x}$O:V thin films obtained by reactive DC sputtering at room temperature

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Transparent and p-type conductive $Ni_{x}$O:V thin films obtained by reactive DC sputtering at room temperature

Content Provider	Scilit
Author	Guillén, Cecilia Herrero, José
Copyright Year	2019
Description	Journal: Materials Research Express A non-magnetic alloy consisting of Ni(92%):V(8%) was used to obtain NixO:V thin films by reactive DC magnetron sputtering on unheated glass substrates. The oxygen content and the nickel oxidation state were modified by the oxygen partial pressure (Opp) applied for sputtering, while the film thickness (t) was changed through the deposition time. The structural, optical and electrical properties of the samples have been analyzed by X-ray diffraction, Raman spectroscopy, spectrophotometry and Hall-effect measurements. Visible transmittance and sheet resistance have been used to evaluate the quality of the films as transparent electrodes, which is found maximum for the layers prepared at 24% Opp with t ≤ 100 nm. These samples show maximum p-type conductivity σ = 0.78 S/cm and optical absorption α = 1.4*10^5 cm-1 at 0.55 μm wavelength, both independent of the layer thickness.
Related Links	https://iopscience.iop.org/article/10.1088/2053-1591/ab2d10/pdf
ISSN	20531591
e-ISSN	20531591
DOI	10.1088/2053-1591/ab2d10
Journal	Materials Research Express
Issue Number	9
Volume Number	6
Language	English
Publisher	IOP Publishing
Publisher Date	2019-06-26
Access Restriction	Open
Subject Keyword	Journal: Materials Research Express Condensed Matter Physics Raman Spectroscopy Type Conductivity
Content Type	Text
Resource Type	Article
Subject	Surfaces, Coatings and Films Metals and Alloys Biomaterials Electronic, Optical and Magnetic Materials Polymers and Plastics

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