Influences of different oxidants on characteristics of La${}_{2}$O${}_{3}$/Al${}_{2}$O${}_{3}$ nanolaminates deposited by atomic layer deposition

Content Provider	Scilit
Author	Fan, Ji-Bin Liu, Hong-Xia Li, Duan Zhang, Yan Yu, Xiao-Chen
Copyright Year	2017
Description	Journal: Chinese Physics B A comparative study of two kinds of oxidants $(H_{2}$O and O with the combination of two metal precursors (TMA and La(PrCp) for atomic layer deposition (ALD) $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates is carried out. The effects of different oxidants on the physical properties and electrical characteristics of $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates are studied. Initial testing results indicate that $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates could avoid moisture absorption in the air after thermal annealing. However, moisture absorption occurs in $H_{2}$O-based $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates due to the residue hydroxyl/hydrogen groups during annealing. As a result, roughness enhancement, band offset variation, low dielectric constant and poor electrical characteristics are measured because the properties of $H_{2}$O-based $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates are deteriorated. Addition thermal annealing effects on the properties of $O_{3}$-based $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates indicate that $O_{3}$ is a more appropriate oxidant to deposit $La_{2}O_{3}/Al_{2}O_{3}$ nanolaminates for electron devices application.
Related Links	http://iopscience.iop.org/article/10.1088/1674-1056/26/6/067701/pdf
ISSN	16741056
e-ISSN	20583834
DOI	10.1088/1674-1056/26/6/067701
Journal	Chinese Physics B
Issue Number	6
Volume Number	26
Language	English
Publisher	IOP Publishing
Publisher Date	2017-06-01
Access Restriction	Open
Subject Keyword	Journal: Chinese Physics B Coatings and Films Atomic Layer Deposition Different Oxidants La2o3/al2o3 Nanolaminates Physical Properties
Content Type	Text
Resource Type	Article
Subject	Physics and Astronomy