Loading...
Please wait, while we are loading the content...
Patterned Alignment of Liquid Crystal on Photopolymer by Single-Exposure Photocuring Process
| Content Provider | Scilit |
|---|---|
| Author | Rajesh, Kumar Rajesh Kumar Yamaguchi, Rumiko Yamaguchi Rumiko Sato, Akira Sato Akira Sato, Susumu Sato Susumu |
| Copyright Year | 1998 |
| Description | Journal: Japanese Journal of Applied Physics We have promoted the complex patterned orientation of liquid crystal on polyvinyl cinnamate (PVCi) substrates by a single-exposure technique using the photocuring process. The process involves the polymerization of the polymer simultaneously by optical and thermal means. The information restored in the form of homogeneous or homeotropic orientation of the liquid crystal is nonerasable and permanent. |
| Related Links | http://iopscience.iop.org/article/10.1143/JJAP.37.6111/pdf |
| ISSN | 00214922 |
| e-ISSN | 13474065 |
| DOI | 10.1143/jjap.37.6111 |
| Journal | Japanese Journal of Applied Physics |
| Issue Number | 11R |
| Volume Number | 37 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 1998-11-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Japanese Journal of Applied Physics |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy Engineering |