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Plasma uniformity in high-density inductively coupled plasma tools
| Content Provider | Scilit |
|---|---|
| Author | Stewart, R. A. Vitello, P. Graves, D. B. Jaeger, E. F. Berry, L. A. |
| Copyright Year | 1995 |
| Description | Journal: Plasma Sources Science and Technology A two-dimensional (r, z) fluid model is used to study plasma transport in inductively coupled plasmas (ICPS). Electron heating from external RF coil driven at 2 MHz is calculated self-consistently by solving for the time-averaged RF electric field. Radial plasma uniformity has been studied in both high (R/L=2.5) and low (R/L=1) aspect ratio ICP reactors driven with external planar or cylindrical coils. The effect of neutral gas pressure on plasma uniformity is presented for Ar discharges at 5 and 20 mTorr. The location of external coils and corresponding power deposition profile is predicted to have little effect on uniformity except at higher pressure (>or approximately= 20 mTorr) and for large aspect ratios. Planar coils appear superior to cylindrical coils for achieving relatively consistent uniformity over a wide range of pressures and reactor aspect ratios. |
| Related Links | http://iopscience.iop.org/article/10.1088/0963-0252/4/1/005/pdf |
| Ending Page | 46 |
| Page Count | 11 |
| Starting Page | 36 |
| ISSN | 09630252 |
| e-ISSN | 13616595 |
| DOI | 10.1088/0963-0252/4/1/005 |
| Journal | Plasma Sources Science and Technology |
| Issue Number | 1 |
| Volume Number | 4 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 1995-02-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Plasma Sources Science and Technology Inductive Coupled Plasma |
| Content Type | Text |
| Resource Type | Article |
| Subject | Condensed Matter Physics |
