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Highly Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
| Content Provider | Scilit |
|---|---|
| Author | Minami, Tadatsugu Sato, Hirotoshi Nanto, Hidehito Takata, Shinzo |
| Copyright Year | 1986 |
| Description | Journal: Japanese Journal of Applied Physics Highly conductive and transparent films of Si-doped ZnO have been prepared by rf magnetron sputtering of a ZnO target with $SiO_{2}$ or SiO dopant added. Films with resistivity as low as $3.8×10^{-4}$ Ω cm and average transmittance above 85% in the visible region can be produced on low temperture substrates at below 250°C. Great improvement in the stability of the resistivity for use at high temperatures was obtained for Si-doped ZnO films in comparison with undoped films. |
| Related Links | http://iopscience.iop.org/article/10.1143/JJAP.25.L776/pdf |
| ISSN | 00214922 |
| e-ISSN | 13474065 |
| DOI | 10.1143/jjap.25.l776 |
| Journal | Japanese Journal of Applied Physics |
| Issue Number | 9A |
| Volume Number | 25 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 1986-09-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Japanese Journal of Applied Physics Magnetron Sputtering Highly Conductive Rf Magnetron Si Doped Zno Films |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy Engineering |
