Loading...
Please wait, while we are loading the content...
Similar Documents
High degree reduction and restoration of graphene oxide on $SiO_{2}$at low temperature via remote Cu-assisted plasma treatment
| Content Provider | Scilit |
|---|---|
| Author | Obata, Seiji Sato, Minoru Akada, Keishi Saiki, Koichiro |
| Copyright Year | 2018 |
| Description | Journal: Nanotechnology A high throughput synthesis method of graphene has been required for a long time to apply graphene to industrial applications. Of the various synthesis methods, the chemical exfoliation of graphite via graphene oxide (GO) is advantageous as far as productivity is concerned; however, the quality of the graphene produced by this method is far inferior to that synthesized by other methods, such as chemical vapor deposition on metals. Developing an effective reduction and restoration method for GO on dielectric substrates has been therefore a key issue. Here, we present a method for changing GO deposited on a dielectric substrate into high crystallinity graphene at 550 °C; this method uses CH4/H2 plasma and a Cu catalyst. We found that Cu remotely catalyzed the high degree reduction and restoration of GO on SiO2 and the effect ranged at least 8 mm. With this method, FET devices can be fabricated without any post treatment such as a transfer process. This plasma treatment increased electron and hole mobilities of GO to 480 cm2 V−1 s−1 and 460 cm2 V−1 s−1 respectively; these values were more than 50 times greater than that of conventional reduced GO. Furthermore, the on-site conversion ensured that the shape of the GO sheets remained unchanged after the treatment. This plasma treatment realizes the high through put synthesis of a desired shaped graphene on any substrate without any residue and damage being caused by the transfer process; as such, it expands the potential applicability of graphene. |
| Related Links | http://iopscience.iop.org/article/10.1088/1361-6528/aab73e/pdf |
| ISSN | 09574484 |
| e-ISSN | 13616528 |
| DOI | 10.1088/1361-6528/aab73e |
| Journal | Nanotechnology |
| Issue Number | 24 |
| Volume Number | 29 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2018-03-16 |
| Access Restriction | Open |
| Subject Keyword | Journal: Nanotechnology |
| Content Type | Text |
| Resource Type | Article |
| Subject | Chemistry Nanoscience and Nanotechnology Mechanics of Materials Mechanical Engineering Bioengineering Electrical and Electronic Engineering |