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Vanadium oxide thin films deposited on indium tin oxide glass by radio-frequency magnetron sputtering
| Content Provider | Scilit |
|---|---|
| Author | Xue-Jin, Wang Yun-Jie, Fei Yan-Yun, Xiong Yu-Xin, Nie Ke-An, Feng Lin-De, Li |
| Copyright Year | 2002 |
| Description | Journal: Chinese Physics Highly oriented $VO_{2}$(B), $VO_{2}$(B) + $V_{6}O_{13}$ films were grown on indium tin oxide glass by radio-frequency magnetron sputtering. Single phase $V_{6}O_{13}$ films were obtained from $VO_{2}$(B) + $V_{6}O_{13}$ films by annealing at 480°C in vacuum. The vanadium oxide films were characterized by x-ray diffraction and x-ray photoelectron spectra (XPS). It was found that the formation of vanadium oxide films was affected by substrate temperature and annealing time, because high substrate temperature and annealing were favourable to further oxidation. Therefore, the formation of high valance vanadium oxide films was realized. The $V_{6}O_{13}$ crystalline sizes become smaller with the increase of annealing time. XPS analysis revealed that the energy position for all the samples was almost constant, but the broadening of the $V_{2p3/2}$ line of the annealed sample was due to the smaller crystal size of $V_{6}O_{13}$. |
| Related Links | http://iopscience.iop.org/article/10.1088/1009-1963/11/7/317/pdf |
| Ending Page | 740 |
| Page Count | 4 |
| Starting Page | 737 |
| ISSN | 10091963 |
| e-ISSN | 17414199 |
| DOI | 10.1088/1009-1963/11/7/317 |
| Journal | Chinese Physics |
| Issue Number | 7 |
| Volume Number | 11 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2002-06-19 |
| Access Restriction | Open |
| Subject Keyword | Journal: Chinese Physics Condensed Matter Physics Thin Films Magnetron Sputtering Vanadium Oxide Oxide Thin |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy |
