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UV Nanoimprint Lithography Process Simulation
| Content Provider | Scilit |
|---|---|
| Copyright Year | 2019 |
| Description | Ultraviolet nanoimprint lithography (UV-NIL) [1] has an advantage in process compatibility with conventional semiconductor lithography. In the UV-NIL, a UV-curable resin is used and cured by UV exposure. Unlike thermal NIL (T-NIL), the resin used in UV-NIL is limited but the process time is short and the process could be done at room temperature. The resin is sometimes called UV resist. Book Name: Nanoimprinting and Its Applications |
| Related Links | https://content.taylorfrancis.com/books/download?dac=C2018-0-93723-8&isbn=9780429031922&doi=10.1201/9780429031922-7&format=pdf |
| Ending Page | 120 |
| Page Count | 18 |
| Starting Page | 103 |
| DOI | 10.1201/9780429031922-7 |
| Language | English |
| Publisher | Informa UK Limited |
| Publisher Date | 2019-06-14 |
| Access Restriction | Open |
| Subject Keyword | Book Name: Nanoimprinting and Its Applications Hardware and Architecturee Nanoimprint Lithography Compatibility Semiconductor |
| Content Type | Text |
| Resource Type | Chapter |