Loading...
Please wait, while we are loading the content...
Microscopy of defects in semiconductors
| Content Provider | Scilit |
|---|---|
| Author | Bruckbauer, Jochen Trager-Cowan, Carol Oliver, Rachel A. |
| Editor | Massabuau, Fabien C. -P |
| Copyright Year | 2019 |
| Description | In this chapter, the authors discuss microscopy techniques that can be useful in addressing defects in semiconductors. They focus on three main families: scanning probe microscopy, scanning electron microscopy and transmission electron microscopy. They first address the basic principles of the selected microscopy techniques In discussions of image formation, they elucidate the mechanisms by which defects are typically imaged in each technique. Then, in the latter part of the chapter, they describe some key examples of the application of microscopy to semiconductor materials, addressing both point and extended defects and both two-dimensional (2D) and three-dimensional (3D) materials. |
| Related Links | https://strathprints.strath.ac.uk/70802/7/Massabuau_etal_IET_2019_Microscopy_of_defects_in_semiconductors.pdf |
| Ending Page | 416 |
| Page Count | 72 |
| Starting Page | 345 |
| DOI | 10.1049/pbcs045e_ch8 |
| Language | English |
| Publisher | Institution of Engineering and Technology (IET) |
| Publisher Date | 2019-09-30 |
| Access Restriction | Open |
| Subject Keyword | Book Name: Characterisation and Control of Defects in Semiconductors Microscopic Research Scanning Electron Microscopy Transmission Electron Microscopy Scanning Probe Microscopy Three-dimensional Materials Two-dimensional Materials |
| Content Type | Text |
| Resource Type | Article |