NDLI: Radiation chemistry and the lithographic performance of chemical amplification resists formulated from poly(4-epoxystyrene-stat-styrene) and a photoacid generator

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Journal of Materials Chemistry Vol - 7 Issue - 2

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Radiation chemistry and the lithographic performance of chemical amplification resists formulated from poly(4-epoxystyrene-stat-styrene) and a photoacid generator

Content Provider	Royal Society of Chemistry (RSC)
Author	Jones, Richard G. Cordina, Gerard P-G. Murphy, Julian J.
Copyright Year	1997
Abstract	Copolymers of styrene and 4-epoxystyrene in formulations with triphenylsulfonium hexafluoroantimonate as a photoacid generator undergo a crosslinking reaction by a chain mechanism when irradiated with 20 keV electrons and hence act as negative-working electron-beam resists. The copolymers have been prepared by a free radical mechanism over the entire composition range and the lithographic performance of the materials has been evaluated. The sensitivities of the resist formulations are shown to correlate with the epoxystyrene content of the copolymers in accordance with a simple model of the radiation chemistry of the system. Contrast variations are explained in terms of the statistical structure of the copolymer and it is demonstrated that at low epoxystyrene contents the systems behave in accordance with an unsensitised single-stage crosslinking mechanism. The copolymers with epoxystyrene contents greater thanca. 8% have such high lithographic sensitivities and show such a good tolerance of processing variations as to commend the optimisation of their performance with a view to their subsequent application as electron-beam resists.
Starting Page	421
Ending Page	427
Page Count	7
File Format	PDF
ISSN	09599428
Volume Number	7
Issue Number	3
Journal	Journal of Materials Chemistry
DOI	10.1039/a606322e
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	Styrene Electronvolt Free-radical halogenation Radiation chemistry Copolymer
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Chemistry

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