NDLI: Helium-argon inductively coupled plasma for plasma source mass spectrometry

Content Provider	Royal Society of Chemistry (RSC)
Author	Sheppard, Brenda S. Shen, Wei-Lung Caruso, Joseph A. Davidson, Timothy M.
Copyright Year	1990
Abstract	An He-Ar mixed gas inductively coupled plasma (ICP) was investigated for use as an ion source for plasma mass spectrometry (MS). The addition of He to Ar produces a plasma capable of ionising high ionisation potential elements more efficiently than the pure Ar plasma. The best signal to noise ratios for metallic elements were obtained with a 20% He plasma, and for halides with a 30% He plasma. The He-Ar mixed gas plasma shows an improvement of one order of magnitude in the detection limits of several metallic elements studied and an improvement of two orders of magnitude for non-metals in comparison with Ar ICP-MS. Figures of merit, including detection limits, linear dynamic ranges, metal oxide ratios and doubly to singly charged ion ratios, are reported and compared with those for Ar ICP-MS.
Starting Page	697
Ending Page	700
Page Count	4
File Format	PDF
ISSN	02679477
Volume Number	5
Issue Number	8
Journal	Journal of Analytical Atomic Spectrometry
DOI	10.1039/JA9900500697
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	Inductively coupled plasma Ion Blood plasma Mass spectrometry Ionization energy
Content Type	Text
Resource Type	Article
Subject	Spectroscopy Analytical Chemistry

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Helium-argon inductively coupled plasma for plasma source mass spectrometry