NDLI: M3: Microscope-based maskless micropatterning with dry film photoresist

Content Provider	PubMed Central
Author	Leigh, Steven Y. Tattu, Aashay Mitchell, Joseph S. B. Emilia, Entcheva
Copyright Year	2010
Abstract	We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40–700 μm). The method allows for flexible in-house maskless photolithography without a dedicated microfabrication facility and is well-suited for rapid prototyping of microfluidic channels, scaffold templates for protein/cell patterning or optically-guided cell encapsulation for biomedical applications.
Related Links	http://dx.doi.org/10.1007/s10544-010-9506-2
Starting Page	375
File Format	PDF
ISSN	15728781
e-ISSN	15728781
Journal	Biomedical microdevices
Issue Number	2
Volume Number	13
Language	English
Publisher Date	2011-04-01
Access Restriction	Open
Subject Keyword	Research in Higher Education
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Molecular Biology Biomedical Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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M3: Microscope-based maskless micropatterning with dry film photoresist