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Design and Characterization of an Optical Proximity Correction (OPC) Mask
| Content Provider | Paperity |
|---|---|
| Author | Varma, Sumir |
| Abstract | A normal binary chrome mask is designed with optical proximity correction features to test their effect on the lithographic image formed. A significant image improvement is seen due to the addition of the OPC features. |
| File Format | HTM / HTML |
| Issue Number | 1 |
| Journal | Journal of the Microelectronic Engineering Conference |
| Volume Number | 7 |
| Language | English |
| Publisher | Rochester Institute of Technology |
| Publisher Date | 2018-09-07 |
| Access Restriction | Open |
| Subject Keyword | Design optical proximity correction mask |
| Content Type | Text |
| Resource Type | Article |