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Caracterización de películas delgadas de carburo de tungsteno (W-C) obtenidas por el método de co-sputtering
| Content Provider | Paperity |
|---|---|
| Author | Yate, L. Prieto, P. Caicedo, J. M. Zambrano, G. Cortés, C. Caicedo, J. C. Muñoz, J. Ipaz, L. |
| Abstract | Tungsten Carbide (W-C) thin films were obtained by R. F. (13.56 MHz) magnetron co-sputtering process in an argon background gas, from mosaic targets of carbon C (99.9%) and tungsten W (99.9%) with different W and C concentrations. Thin films were deposited at temperatures between 300 and 500 °C onto the silicon (100) and AISI D3 steel substrates. X-ray diffraction analysis shows the different hexagonal WC and orthorhombic W2C subcarbide obtained phases, directly depending on tungsten concentration in the mosaic targets, and on the deposition temperature. Fourier Transform Infrared Spectroscopy (FTIR) results of films deposited from different mosaic targets revealed the presence of a peak at 1730 cm-1 associated to the C=O, carbonyls groups and a broad band centered near 1340 cm-1 in which there are two modes of cubic and hexagonal phases of W-C at 1144 and 1220 cm-1, respectively.Keywords : Tungsten carbide; Magnetron sputtering; Co-sputtering. |
| Starting Page | 30 |
| Ending Page | 32 |
| File Format | HTM / HTML |
| ISSN | 16653521 |
| Issue Number | 3 |
| Journal | Superficies y vacío |
| Volume Number | 21 |
| Language | English Spanish |
| Publisher Date | 2008-01-09 |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
| Subject | Surfaces, Coatings and Films |
