NDLI: Fabrication of Ultralow Stress $TiO_{2}/SiO_{2}$ Optical Coatings by Plasma Ion-Assisted Deposition

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Fabrication of Ultralow Stress $TiO_{2}/SiO_{2}$ Optical Coatings by Plasma Ion-Assisted Deposition

Content Provider	MDPI
Author	Guo, Chun Kong, Mingdong
Copyright Year	2020
Description	Optical and mechanical properties of multilayer coatings depend on the selected layer materials and the deposition technology; therefore, knowledge of the performances of thin films is essential. In the present work, titanium dioxide (TiO2) and silicon dioxide (SiO2) thin films have been prepared by plasma ion-assisted deposition (PIAD). The optical, structural, and mechanical properties of thin films have been investigated using spectrometer/ellipsometer, X-ray diffraction (XRD), atomic force microscopy (AFM), and laser interferometer. The results show that TiO2 film fabricated by PIAD induces a high refractive index, wide optical band gap, amorphous structure, smooth surface, and tensile stress. In the case of SiO2 film, high bias voltage leads to dense structure and compressive stress. As an application, a three-wavelength high reflectance at 632.8, 808, and 1550 nm was optimized and deposited. The dependence of total stress in the multilayer on the substrate temperature was studied as well. In conclusion, it was demonstrated that PIAD is an effective method for the preparation of ultralow stress TiO2/SiO2 multilayer films. The achieved stress was as low as 1.4 MPa. The result could provide guidance to the stress optimization of most optical components without prefiguring, backside coating, and postdeposition treatments.
Starting Page	720
e-ISSN	20796412
DOI	10.3390/coatings10080720
Journal	Coatings
Issue Number	8
Volume Number	10
Language	English
Publisher	MDPI
Publisher Date	2020-07-23
Access Restriction	Open
Subject Keyword	Coatings Coatings and Films Stress Plasma Ion-assisted Deposition Tio2 Film Sio2 Film Annealing Treatment
Content Type	Text
Resource Type	Article

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