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Properties of $Al_{2}O_{3}$ Thin Films Grown by PE-ALD at Low Temperature Using $H_{2}$O and $O_{2}$ Plasma Oxidants
| Content Provider | MDPI |
|---|---|
| Author | Castillo-Saenz, Jhonathan Nedev, Nicola Valdez-Salas, Benjamín Curiel-Alvarez, Mario Mendivil-Palma, María Isabel Hernandez-Como, Norberto Martinez-Puente, Marcelo Mateos, David Perez-Landeros, Oscar Martinez-Guerra, Eduardo |
| Copyright Year | 2021 |
| Description | $Al_{2}O_{3}$ layers with thicknesses in the 25–120 nm range were deposited by plasma enhanced atomic layer deposition at 70 °C. Trimethylaluminum was used as organometallic precursor, $O_{2}$ and $H_{2}$O as oxidant agents and Ar as a purge gas. The deposition cycle consisted of 50 ms TMA pulse/10 s purge time/6 s of plasma oxidation at 200 W/10 s purge time. The optical constants and thicknesses of the grown layers were determined by spectroscopic ellipsometry, while the roughness was measured by atomic force microscopy, giving RMS values in the 0.29–0.32 nm range for films deposited under different conditions and having different thicknesses. High transmittance, ~90%, was measured by UV–Vis spectroscopy. X-ray photoelectron spectroscopy revealed that, with both types of oxidants, the obtained films are close to stoichiometric composition and, with high purity, no carbon was detected. Electrical characterization showed good insulating properties of both types of films, though the $H_{2}$O oxidant leads to better I-V characteristics. |
| Starting Page | 1266 |
| e-ISSN | 20796412 |
| DOI | 10.3390/coatings11101266 |
| Journal | Coatings |
| Issue Number | 10 |
| Volume Number | 11 |
| Language | English |
| Publisher | MDPI |
| Publisher Date | 2021-10-19 |
| Access Restriction | Open |
| Subject Keyword | Coatings Al2o3 Thin Films Pe-ald Low Temperature |
| Content Type | Text |
| Resource Type | Article |
