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Deep-Ultraviolet Transparent Conductive $MWCNT/SiO_{2}$ Composite Thin Film Fabricated by UV Irradiation at Ambient Temperature onto Spin-Coated Molecular Precursor Film
| Content Provider | MDPI |
|---|---|
| Author | Nagai, Hiroki Ogawa, Naoki Sato, Mitsunobu |
| Copyright Year | 2021 |
| Description | Deep-ultraviolet (DUV) light-transparent conductive composite thin films, consisting of dispersed multiwalled carbon nanotubes (MWCNTs) and $SiO_{2}$ matrix composites, were fabricated on a quartz glass substrate. Transparent and well-adhered amorphous thin films, with a thickness of 220 nm, were obtained by weak ultraviolet (UV) irradiation (4 mW $cm^{−2}$ at 254 nm) for more than 6 h at 20−40 °C onto the precursor films, which were obtained by spin coating with a mixed solution of MWCNT in water and Si(IV) complex in ethanol. The electrical resistivity of $MWCNT/SiO_{2}$ composite thin film is 0.7 Ω·cm, and transmittance in the wavelength region from DUV to visible light is higher than 80%. The $MWCNT/SiO_{2}$ composite thin film showed scratch resistance at pencil hardness of 8H. Importantly, the resistivity of the $MWCNT/SiO_{2}$ composite thin film was maintained at the original level even after heat treatment at 500 °C for 1 h. It was observed that the heat treatment of the composite thin film improved durability against both aqueous solutions involving a strong acid (HCl) and a strong base (NaOH). |
| Starting Page | 1348 |
| e-ISSN | 20794991 |
| DOI | 10.3390/nano11051348 |
| Journal | Nanomaterials |
| Issue Number | 5 |
| Volume Number | 11 |
| Language | English |
| Publisher | MDPI |
| Publisher Date | 2021-05-20 |
| Access Restriction | Open |
| Subject Keyword | Nanomaterials Coatings and Films Deep Ultraviolet Transparent Conductive Thin Film Mwcnt/sio2 Molecular Precursor Method Scratch Resistance Heat and Chemical Resistance |
| Content Type | Text |
| Resource Type | Article |