NDLI: Nanohollow Titanium Oxide Structures on Ti/FTO Glass Formed by Step-Bias Anodic Oxidation for Photoelectrochemical Enhancement

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Nanohollow Titanium Oxide Structures on Ti/FTO Glass Formed by Step-Bias Anodic Oxidation for Photoelectrochemical Enhancement

Content Provider	MDPI
Author	Huang, Chi-Hsien Lu, Yu-Jen Pan, Yong-Chen Liu, Hui-Ling Chang, Jia-Yuan Sie, Jhao-Liang Pijanowska, Dorota G. Yang, Chia-Ming
Copyright Year	2022
Description	In this study, a new anodic oxidation with a step-bias increment is proposed to evaluate oxidized titanium (Ti) nanostructures on transparent fluorine-doped tin oxide (FTO) on glass. The optimal Ti thickness was determined to be 130 nm. Compared to the use of a conventional constant bias of 25 V, a bias ranging from 5 V to 20 V with a step size of 5 V for 3 min per period can be used to prepare a titanium oxide $(TiO_{x}$) layer with nanohollows that shows a large increase in current of 142% under UV illumination provided by a 365 nm LED at a power of 83 mW. Based on AFM and SEM, the $TiO_{x}$ grains formed in the step-bias anodic oxidation were found to lead to nanohollow generation. Results obtained from EDS mapping, HR-TEM and XPS all verified the $TiO_{x}$ composition and supported nanohollow formation. The nanohollows formed in a thin $TiO_{x}$ layer can lead to a high surface roughness and photon absorbance for photocurrent generation. With this step-bias anodic oxidation methodology, $TiO_{x}$ with nanohollows can be obtained easily without any extra cost for realizing a high current under photoelectrochemical measurements that shows potential for electrochemical-based sensing applications.
Starting Page	1925
e-ISSN	20794991
DOI	10.3390/nano12111925
Journal	Nanomaterials
Issue Number	11
Volume Number	12
Language	English
Publisher	MDPI
Publisher Date	2022-06-04
Access Restriction	Open
Subject Keyword	Nanomaterials Analytical Chemistry Tiox Anodic Oxidation Photoelectrochemical Nanohollows
Content Type	Text
Resource Type	Article

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