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Intrinsic Properties and Future Perspective of $HfO_{2}/V_{2}O_{5}/HfO_{2}$ Multi-Layer Thin Films via E-Beam Evaporation as a Transparent Heat Mirror
| Content Provider | MDPI |
|---|---|
| Author | Cheema, Daniyal Asif Danial, Muhammad Osama Hanif, Muhammad Bilal Alghamdi, Abdulaziz Salem Ramadan, Mohamed Khaliq, Abdul Khan, Abdul Faheem Subhani, Tayyab Motola, Martin |
| Copyright Year | 2022 |
| Description | $HfO_{2}$ and $V_{2}O_{5}$ as multi-layer thin films are discussed for their potential use as transparent heat mirrors. Multi-layered $HfO_{2}/V_{2}O_{5}/HfO_{2}$ thin films with a thickness of 100/60/100 nm were prepared via e-beam evaporation on a soda–lime glass substrate. Rutherford backscattering confirmed the multi-layer structure with uniform surface. The as-deposited thin films were annealed at 300 °C and 400 °C, respectively, for 1 h in air. The transmittance of approximately 90% was obtained for all thin films. Due to the relatively low thickness and non-stoichiometry of $HfO_{2}$, a band gap of approximately 3.25 eV was determined (instead of the theoretical 5.3–5.7 eV). The as-deposited thin films possessed conductivity of approximately 0.2 $Ω^{−1}cm^{−1}$ and increased to 1 $Ω^{−1}cm^{−1}$ and 2 $Ω^{−1}cm^{−1}$ for thin films annealed at 300 and 400 °C, respectively. Due to the unique intrinsic properties of $HfO_{2}/V_{2}O_{5}/HfO_{2}$ thin films, the results obtained are promising for application as a transparent heat mirror. |
| Starting Page | 448 |
| e-ISSN | 20796412 |
| DOI | 10.3390/coatings12040448 |
| Journal | Coatings |
| Issue Number | 4 |
| Volume Number | 12 |
| Language | English |
| Publisher | MDPI |
| Publisher Date | 2022-03-25 |
| Access Restriction | Open |
| Subject Keyword | Coatings Ceramics V2o5 Hfo2 Multi-layer Thin Films Transparent Heat Mirror |
| Content Type | Text |
| Resource Type | Article |
