NDLI: Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

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Volume: 8

Volume: 7

SnS Thin Film Solar Cells: Perspectives and Limitations

Static and Dynamic Magnetization Investigation in Permalloy Electrodeposited onto High Resistive N-Type Silicon Substrates

Microstructural Changes of Al Hot-Dipped P91 Steel during High-Temperature Oxidation

Damping Optimization of Hard-Coating Thin Plate by the Modified Modal Strain Energy Method

Assessment on the Effects of ZnO and Coated ZnO Particles on iPP and PLA Properties for Application in Food Packaging

Coating Qualities Deposited Using Three Different Thermal Spray Technologies in Relation with Temperatures and Velocities of Spray Droplets

Effects of Rare Earth Elements on Properties of Ni-Base Superalloy Powders and Coatings

Improving the Wear Resistance of Moulds for the Injection of Glass Fibre–Reinforced Plastics Using PVD Coatings: A Comparative Study

Surface Enhanced Raman Scattering Substrates Made by Oblique Angle Deposition: Methods and Applications

Corrosion Protection Systems and Fatigue Corrosion in Offshore Wind Structures: Current Status and Future Perspectives

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Multiscale Computational Fluid Dynamics: Methodology and Application to PECVD of Thin Film Solar Cells

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Recent Developments in Accelerated Antibacterial Inactivation on 2D Cu-Titania Surfaces under Indoor Visible Light

Interfacial Mechanics Analysis of a Brittle Coating–Ductile Substrate System Involved in Thermoelastic Contact

Electroplating of CdTe Thin Films from Cadmium Sulphate Precursor and Comparison of Layers Grown by 3-Electrode and 2-Electrode Systems

Influence of the Distribution of a Spray Paint on the Efficacy of Anti-Graffiti Coatings on a Highly Porous Natural Stone Material

Fabrication of Efficient Cu2ZnSnS4 Solar Cells by Sputtering Single Stoichiometric Target

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Content Provider	MDPI
Author	Vernardou, Dimitra
Abstract	Vanadium pentoxide coatings were grown by atmospheric pressure chemical vapor deposition varying the gas precursor ratio (vanadium (IV) chloride:water) and the substrate temperature. All samples were characterized by X-ray diffraction, Raman spectroscopy, scanning electron microscopy, cyclic voltammetry, and transmittance measurements. The water flow rate was found to affect the crystallinity and the morphological characteristics of vanadium pentoxide. Dense stacks of long grains of crystalline oxide are formed at the highest amount of water utilized for a substrate temperature of 450 °C. Accordingly, it was indicated that for higher temperatures and a constant gas precursor ratio of 1:7, the surface morphology becomes flattened, and columnar grains of uniform size and shape are indicated, keeping the high crystalline quality of the material. Hence, it was possible to define a frame of operating parameters wherein single-phase vanadium pentoxide may be reliably expected, including a gas precursor ratio of 1:7 with a substrate temperature of >450 °C. The as-grown vanadium pentoxide at 550 °C for a gas precursor ratio of 1:7 presented the best electrochemical performance, including a diffusion coefficient of 9.19 × 10−11 cm2·s−1, a charge density of 3.1 mC·cm−2, and a coloration efficiency of 336 cm2·C−1. One may then say that this route can be important for the growth of large-scale electrodes with good performance for electrochromic devices.
File Size	3557376
File Format	PDF
e-ISSN	20796412
DOI	10.3390/coatings7020024
Journal	Coatings
Issue Number	2
Volume Number	7
Language	English
Publisher Date	2017-02-08
Access Restriction	Open
Subject Keyword	atmospheric pressure chemical vapor deposition (APCVD) vanadium pentoxide electroactive material
Content Type	Text
Resource Type	Article

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Time variant layer control in atmospheric pressure chemical vapor deposition based growth of graphene

Thermal control and rate of deposition system of chemical vapor deposition at atmospheric pressure ; production of thin tin-oxide films by an APCVD process

Electrochromic Properties of the Vanadium Pentoxide Doped with Nickel as an Ionic Storage Layer

Nano-vanadium pentoxide films for electrochromic displays

Photoconductivities in monocrystalline layered V2O5 nanowires grown by physical vapor deposition

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Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

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