NDLI: Fabrication of size-tunable hierarchical CrN nanohole arrays for two-dimensional nanomould using modified nanosphere lithography

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Fabrication of size-tunable hierarchical CrN nanohole arrays for two-dimensional nanomould using modified nanosphere lithography

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Fabrication of size-tunable hierarchical CrN nanohole arrays for two-dimensional nanomould using modified nanosphere lithography

Content Provider	IET Digital Library
Author	Wu, Hung Chun Bao, Ming Dong Ma, Kung Jeng
Abstract	This Letter presents a low-cost, high-throughput strategy for fabricating size-tunable hierarchical CrN nanohole arrays for a nanomould using a magnetron sputtering approach with nanosphere lithography (NIL)-based technology. The size of the polystyrene nanospheres has a direct inﬂuence on the diameter and period of the CrN nanohole structure. The reactive ion etching and magnetron sputtering process can easily control the nanohole size and depth. The hole depth generally depends on the ﬁlm thickness. The contact angles were measured by the sessile drop method using distilled water, ethylene glycol and diiodomethane. The surface-free energy of the CrN nanomould was calculated using the Owens–Wendt geometric mean approach. This Letter reports the successful fabrication of a series of nanoholes with diameters decreased from 347 ± 9.6 to approximately 166 ± 11.8 nm with a depth of 100 ± 5.6 nm. The corresponding surface-free energy decreased from 40.83 to approximately 24.58 mN/m. The diameter of nanoholes has an obvious effect on the surface-free energy and there is tendency for the surface-free energy to decrease with the decrease in the diameter of the nanoholes. This new approach of ordered CrN nanohole array structures can be used to create a two-dimensional nanomould for NIL.
Starting Page	491
Ending Page	495
Page Count	5
Volume Number	9
e-ISSN	17500443
Issue Number	Issue 8, Aug (2014)
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/mnl/9/8
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/10.1049/mnl.2014.0013
Journal	Micro & Nano Letters
Publisher Date	2014-07-30
Access Restriction	Open
Rights Holder	© The Institution of Engineering and Technology
Subject Keyword	Chromium Compounds Contact Angle Contact Angles Corrosion CrN Deposition by Sputtering Diiodomethane Distilled Water Etching Ethylene Glycol Free Energy Hole Depth Magnetron Sputtering Modified Nanosphere Lithography Nanofabrication Nanohole Array Structure Nanolithography NanoParticle Nanosphere Lithography-based Technology Nanostructured Material Nanotube And Nanostructured Material Other Surface Treatments Owens-Wendt Geometric Mean Approach Oxidation Plasma Application in Manufacturing And Material Processing Polymer Reactive Ion Etching Sessile Drop Method Size-tunable Hierarchical Nanohole Array Sputter Deposition Sputter Etching Structure of Solid Clusters Surface Energy Surface Energy of Solids; Thermodynamic Property Surface-free Energy Thermodynamic Property And Entropy Two-dimensional Nanomould
Content Type	Text
Resource Type	Article

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