NDLI: Study of reactive ion etched (RIE) facets of silicon- on-insulator (SOI) rip waveguides

Content Provider	IEEE Xplore Digital Library
Author	Zimmermann, L. Schnarrenberger, M. Mitze, T. Bruns, J. Petermann, K.
Copyright Year	2005
Description	Author affiliation: Institut fur Hochfrequenz-und Halbleiter-Systemtechnologien, Technische Univ. Berlin, Germany (Zimmermann, L.; Schnarrenberger, M.; Mitze, T.; Bruns, J.; Petermann, K.)
Abstract	In our study we compare the quality of dry etched rip waveguide facets to facets prepared by a conventional polishing technique. Linear SOI waveguide arrays were fabricated on BESOI (bonded and etched-back SOI) material with a silicon top-layer of H = 4 /spl mu/m. We used standard contact lithography for patterning and a commercial RIE system for waveguide and facet etching. We studied different process flows (facet-first and rip-first), different masking materials and loading effects on the wafer. The surface of the facets was characterized by high resolution scanning electron microscopy (SEM). The additional coupling loss introduced by the process flow and by the etching conditions as well as the impact of the two on uniformity of the waveguide transmission were quantified by means of fiber-to-fiber optical measurements (at 1.55 /spl mu/m).
Starting Page	260
Ending Page	264
File Size	1251909
Page Count	5
File Format	PDF
ISBN	0780389492
DOI	10.1109/WFOPC.2005.1462136
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-06-22
Publisher Place	Italy
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Wafer bonding Optical fiber losses Scanning electron microscopy Dry etching Lithography Propagation losses Silicon Optical coupling Optical waveguides Optical surface waves
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in