NDLI: Development of bipolar pulse accelerator for pulsed ion beam implantation to semiconductor

Content Provider	IEEE Xplore Digital Library
Author	Masugata, Katsumi Kawahara, Yoshihiro Mitsui, Chihiro Kitamura, Iwao Takahashi, Takakazu Tanaka, Yasunori Tanoue, Hisao Aral, Kazuo
Copyright Year	2002
Description	Author affiliation: National Institute of Advanced Industry Science and Technology, Tukuba, 305-8568, Japan (Tanaka, Yasunori; Tanoue, Hisao; Aral, Kazuo) \|\| Faculty of Engineering, Toyama University, 930-8555, Japan (Masugata, Katsumi; Kawahara, Yoshihiro; Mitsui, Chihiro; Kitamura, Iwao; Takahashi, Takakazu)
Abstract	To improve the purity of the ion beams new type of pulsed power ion accelerator named “bipolar pulse accelerator” was proposed. The accelerator consists of two acceleration gaps (an ion source gap and a post acceleration gap) and a drift tube, and a bipolar pulse is applied to the drift tube to accelerate the beam. In the accelerator intended ions are selectively accelerated and the purity of the ion beam is enhanced. As the first step of the development of the accelerator, a Br-type magnetically insulated acceleration gap is developed. The gap has an ion source of coaxial gas puff plasma gun on the grounded anode and a negative pulse is applied to the cathode to accelerate the ion beam. By using the plasma gun, ion source plasma (nitrogen) of current density around 100 $A/cm^{2}$ is obtained. In the paper, the experimental results of the evaluation of the ion beam and the characteristics of the gap are shown with the principle and the design concept of the proposed accelerator.
Starting Page	413
Ending Page	416
File Size	784259
Page Count	4
File Format	PDF
ISBN	9780735401075
ISSN	0094243X
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2002-06-23
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	AIP
Subject Keyword	Coils Nitrogen Anodes
Content Type	Text
Resource Type	Article
Subject	Physics and Astronomy

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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Intense pulsed heavy ion beam acceleration using bipolar pulse for implantation to semiconductor

Development of intense pulsed heavy ion beam accelerator using bipolar pulse for implantation to semiconductor

Development of bipolar accelerator for pulsed ion beam implantation

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Development of Bipolar Pulse Accelerator for Intense Pulsed Heavy Ion Beam

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