NDLI: Deposition of a-C:H films on large-area plane dielectric substrates by means of pulsed surface discharge at atmospheric pressure

Content Provider	IEEE Xplore Digital Library
Author	Bugaev, S.P. Oskomov, K.V. Sochugov, N.S.
Copyright Year	1998
Description	Author affiliation: Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia (Bugaev, S.P.)
Abstract	A new-developed method for deposition of amorphous hydrogenated diamond-like carbon (a-C:H) films on plate dielectric substrates by means of pulsed surface (gliding) discharge at atmospheric pressure is presented here. It was found that films properties are influenced mainly by pulse volume energy density and, in less extent, by average surface power density of discharge, with optimum at about 75 J/cm/sup 3/ and 2-3 W/cm/sup 2/ correspondingly. Diamond-like films deposited from methane under these conditions are similar to those obtained by traditional low-pressure (p<10 Torr) methods of chemical vapour deposition, but the equipment for a-C:H film deposition in the surface discharges is much simpler and cheaper than the vacuum systems with various types of plasma generator conventionally used for this purpose. To demonstrate technological potential of the proposed method set-up for deposition of a-C:H films on flat dielectric substrates of 20/spl times/50 cm/sup 2/ was created.
Starting Page	973
Ending Page	976
File Size	342222
Page Count	4
File Format	PDF
ISBN	0780342879
DOI	10.1109/BEAMS.1998.817015
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1998-06-12
Publisher Place	Israel
Access Restriction	Subscribed
Rights Holder	Beam Organizing Committee
Subject Keyword	Electrodes Plasma properties Surface discharges Dielectric substrates Voltage Fault location Diamond-like carbon Amorphous materials Sparks Coatings
Content Type	Text
Resource Type	Article

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