NDLI: Depositing of diamond-like films by plasma jets

Content Provider	IEEE Xplore Digital Library
Author	Gradzka-Dahlke, M. Grib, V.N. Dabrowski, J.R. Karolinskiy, V.G. Khvisevich, V.M. Sazonov, M.I.
Copyright Year	2001
Description	Author affiliation: Bialystok Tech. Univ., Wiejska, Poland (Gradzka-Dahlke, M.)
Abstract	At the present time there are a number of methods for obtaining diamond-like carbon films. One of the most efficient techniques is the CVD method used for depositing films from the gaseous phase in a vacuum with the pressure maintained at low levels. To achieve high rates of film growth, when using this method, it is necessary to generate a supersonic Ar plasma jet and inject into it various mixtures of gases with carbon-containing reactants (CH/sub 4/, C/sub 2/H/sub 2/, etc.). The deposition of films was carried out by means of the VPP-2 vacuum plasma setup, developed by Brest Technical University in cooperation with Smorgon Optical Machine-Tool factory. The properties of the obtained films were studied using such conventional analytical methods as: Optical Emission Spectroscopy, Coherent Anti-Stokes Raman Scattering-CARS, Auger and Scanning Electron Microscopy and Secondary Ion Mass Spectroscopy. The results of the investigation show that the size of sp/sup 3/ and sp/sup 2/ hybridized crystalline clusters is dependent on the temperature and the bias voltage of the substrate. The deposited films are of the i-C and a-C types. The film deposition rate is 50 to 120 /spl mu/m/h, depending on the chemical composition of the plasma jet, its power and the substrate temperature.
Sponsorship	KEiT
Starting Page	112
Ending Page	113
File Size	97992
Page Count	2
File Format	PDF
ISBN	0780371364
DOI	10.1109/WBL.2001.946563
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2001-06-26
Publisher Place	Poland
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Particle beam optics Optical microscopy Stimulated emission Raman scattering Vacuum technology Electron optics Mass spectroscopy Optical films Optical scattering Plasma temperature
Content Type	Text
Resource Type	Article

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