NDLI: Photolithographic Patterning in Supercritical Carbon Dioxide: Application to Patterned Light-emitting Devices

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Development of Plasma-Damage Free Neutral Beam Sputtering System; High Performance Indium Tin Oxide Films at Room Temperature with Application to Top Emmission OLED

Photolithographic Patterning in Supercritical Carbon Dioxide: Application to Patterned Light-emitting Devices

Content Provider	IEEE Xplore Digital Library
Author	Ha Soo Hwang Zakhidov, A. Jin-Kyun Lee DeFranco, J.A. Hon Hang Fong Malliaras, G.G. Ober, C.K.
Copyright Year	2008
Description	Author affiliation: Dept. of Mater. Sci. & Eng., Cornell Univ., Ithaca, NY (Ha Soo Hwang; Zakhidov, A.; Jin-Kyun Lee; DeFranco, J.A.; Hon Hang Fong; Malliaras, G.G.; Ober, C.K.)
Abstract	Photolithography is a high-throughput, cost-effective patterning technology. However, the application to organic electronic devices has been restricted because of its chemical compatibility issue with delicate organic materials. In this study we propose a new photolithography technique which utilizes supercritical carbon dioxide $(scO_{2})$ as an organic electronic materials-benign development solvent. Supercritical carbon dioxide is a fluid that exists above its critical pressure and temperature $(P_{c}=73.8$ bar and $T_{c}=31.1degC).$ Apart from the environmental advantages, useful process benefits result from the fact that most non-fluorinated organic materials are not damaged in contact with $scCO_{2}.$ A polymeric material composed of perfluorodecyl methacrylate (FDMA) and tert-butyl methacrylate (TBMA) was synthesized as a negative-tone photoresist, processible in $scCO_{2}.$ Micron-sized resist patterns on a Si wafer were successfully processed under i-line (lambda=365 nm) exposure conditions. The resist showed a capability to make patterns on the conductive poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT: PSS) film. The resulting resist pattern was finally applied to fabricate patterned polymer light-emitting devices.
Starting Page	1
Ending Page	4
File Size	2150053
Page Count	4
File Format	PDF
ISBN	9781424420537
DOI	10.1109/FEDC.2008.4483878
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-01-21
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Solvents Temperature Organic materials Lithography Carbon dioxide Additive patterning Supercritical carbon dioxide (scCO2) Chemical technology Subtractive patterning Resists Electroluminescence (EL) Organic chemicals Polymers Photolithography Organic electronics
Content Type	Text
Resource Type	Article

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