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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Fuyuan Luo Juan Yin |
| Copyright Year | 2008 |
| Description | Author affiliation: Jincheng Coll., Nanjing Univ. of Aeronaut. & Astronaut., Nanjing (Juan Yin) || Coll. of Mech. & Electr. Eng., Nanjing Univ. of Aeronaut. & Astronaut., Nanjing (Fuyuan Luo) |
| Abstract | Step movement and scan movement are two main types of movement associated with step and scan optical lithography tools. To save moving time and ensure high accuracy of exposure scan, a novel time-optimal overlapping scheduling algorithm is proposed on the basis of serial scheduling algorithm. At first, the timetable on the switch time of each speed phase of separate successive step movement and scan movement is deduced according to S-curve acceleration and deceleration characteristics. Then the timetable is rescheduled by the proposed overlapping scheduling algorithm on the constraint of exposure scan so that the step movement and scan movement can be overlapped. As a result, the exposure efficiency of wafer is improved. The simulation and experimental results verify the correctness and validity of the proposed algorithm. |
| Starting Page | 1702 |
| Ending Page | 1707 |
| File Size | 289846 |
| Page Count | 6 |
| File Format | |
| ISBN | 9781424422869 |
| DOI | 10.1109/ICARCV.2008.4795783 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2008-12-17 |
| Publisher Place | Vietnam |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Optimal scheduling Scheduling algorithm Motion control Lithography Acceleration High speed optical techniques Lenses Circuits Robotics and automation Educational institutions scheduling step and scan motion control acceleration and deceleration overlap |
| Content Type | Text |
| Resource Type | Article |
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