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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Hnin, Y.Y.K. Poh, W.C. Wong, S.K. Tan, H.K. Piramanayagam, S.N. |
| Copyright Year | 2012 |
| Description | Author affiliation: Data Storage Institute, Singapore (Hnin, Y.Y.K.; Poh, W.C.; Wong, S.K.; Tan, H.K.; Piramanayagam, S.N.) |
| Abstract | The microdomain orientation in thin films of cylinder- and lamella- forming polystyrene-block-polymethyl methacrylate (PS-b-PMMA) copolymers on functional poly (styrene-r- methyl methacrylate) P(S-r-MMA) or polystyrene (PS) brushed substrates was studied using field emission scanning electron microscopy (FE-SEM). In order to prepare a well-ordered block copolymer nanotemplate in an equilibrated morphology the substrate material must have reactive functional groups for surface modification as well as extremely low surface roughness. The surface functionality is given by the reactive hydroxyl group at the oxides surfaces. The reactive hydroxyl group could be controlled by modifying in surface cleaning process. The homogeneity of patterned area was increased from about 300 nm to >6 µm after 5 min ultraviolet ozone treatment. |
| Starting Page | 1 |
| Ending Page | 2 |
| File Size | 1061444 |
| Page Count | 2 |
| File Format | |
| ISBN | 9781467347341 |
| e-ISBN | 9789810720568 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2012-10-31 |
| Publisher Place | Singapore |
| Access Restriction | Subscribed |
| Rights Holder | DSI |
| Subject Keyword | Rough surfaces Surface roughness Surface morphology Substrates Films Scanning electron microscopy un-patterned substrates and long-ranged order Bit patterned media block copolymer self-assembly poly (styrene-block- methyl methacrylate) PS-b-PMMA |
| Content Type | Text |
| Resource Type | Article |
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