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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Sriphung, C. Chokprasombat, K. Sirisathitkul, C. |
| Copyright Year | 2010 |
| Description | Author affiliation: Sch. of Sci., Walailak Univ., Nakhon Si Thammarat, Thailand (Chokprasombat, K.; Sirisathitkul, C.) || Synchrotron Light Res. Inst., Nakhon Ratchasima, Thailand (Sriphung, C.) |
| Abstract | With current technology, the resist lithography can be implemented to fabricate microstructures with high-aspect-ratio geometries. In this work, arrays of SU-8 photoresist pillars (10×10×50 microns) on a copper substrate were patterned by X-ray (wavelength 1.24 nm) from a synchrotron source. Pattern defined silver dots on a graphite mask partially covered the substrate exposed to the X-ray. After the resist developing, the chemically stable and mechanically hardened SU-8 pillars can be used for subsequent magnetic depositions in spite of incomplete pattern in some areas of the substrate. |
| Starting Page | 1 |
| Ending Page | 2 |
| File Size | 1183808 |
| Page Count | 2 |
| File Format | |
| ISBN | 9781424481033 |
| e-ISBN | 9789810860691 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-11-10 |
| Publisher Place | Singapore |
| Access Restriction | Subscribed |
| Rights Holder | DSI |
| Subject Keyword | Lithography Radiation effects Optical device fabrication Irrigation X-ray lithography High aspect ratio microstructure SU-8 photoresist Synchrotron radiation |
| Content Type | Text |
| Resource Type | Article |
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