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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Rosenthal, P.A. Paine, B.M. Kubota, N.T. Sunderland, D.A. |
| Copyright Year | 2004 |
| Description | Author affiliation: Boeing Satellite Syst. Inc., El Segundo, CA, USA (Rosenthal, P.A.; Paine, B.M.; Kubota, N.T.; Sunderland, D.A.) |
| Abstract | We have conducted accelerated lifetesting on discrete HBTs fabricated with the IBM SiGe5HP HBT technology, and determined the dependence of the wear-out on emitter interconnect temperature and current density. The wearout occurred by degradation of DC current gain, /spl beta/, caused by increase of the base current. The characteristics and the parametric dependences of the /spl beta/ degradation were consistent with an electromigration (EM) mechanism originally developed by IBM. EM in the emitter interconnects causes compressive stress on the emitter semiconductor sufficient to alter the semiconductor energy band structure, leading to an increase in base current and associated reduction in /spl beta/. Utilizing our empirically determined acceleration parameters, we have estimated the worst-case expected changes in /spl beta/ during typical use conditions (125 /spl deg/C, J/sub i/=1.0 mA//spl mu/m/sup 2/). The results showed that after 20 years /spl beta/ would degrade by approximately 17/spl plusmn/1%. This degradation is insignificant for most IC applications, and we therefore conclude that this technology is highly reliable during long-term forward-active bias operation. |
| Sponsorship | JEDEC JC-14.7 Comm. on Gallium Arsenide Reliability and Quality Stand |
| Starting Page | 45 |
| Ending Page | 57 |
| File Size | 516108 |
| Page Count | 13 |
| File Format | |
| ISBN | 0790801051 |
| DOI | 10.1109/ROCS.2004.184344 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2004-10-24 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | JEDEC |
| Subject Keyword | Acceleration Silicon germanium Germanium silicon alloys Degradation Heterojunction bipolar transistors Temperature dependence Current density Electromigration Compressive stress Lead compounds |
| Content Type | Text |
| Resource Type | Article |
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