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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Tashima, D. Kurosawatsu, K. Sung, Y.M. Otsubo, M. Honda, C. |
| Copyright Year | 2006 |
| Description | Author affiliation: Dept. of Electr. & Electron. Eng., Miyazaki Univ. (Tashima, D.; Kurosawatsu, K.) |
| Abstract | In this research, we measured spatio-temporal profiles of positive and negative charges in Electric Double Layer Capacitors (EDLCs) consist of activated carbon exposed to plasma discharge. The state of plasma is a high frequency glow discharge and sample of activated carbon is set on the center of glow discharge. Optimal conditions for plasma surface treatment of activated carbon have been examined with a time of 1~10 h at 150degC in $N_{2}.$ As the result, nitrogen atom is doped in the surface layer of the activated carbon, and capacitance of EDLCs has a peak in case of 1 h of plasma surface treatment. It is reported that capacitance increases with the nitrogen dope. Capacitance of EDLCs increased until 1 h of treatment time, but capacitance was decreasing in case of over 1 h of treatment time |
| Sponsorship | IEEE Dielectics and Electr. Insulation Soc. Udayana Univ. Bali |
| Starting Page | 908 |
| Ending Page | 911 |
| File Size | 4209777 |
| Page Count | 4 |
| File Format | |
| ISBN | 1424401895 |
| DOI | 10.1109/ICPADM.2006.284324 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2006-06-26 |
| Publisher Place | Indonesia |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Nitrogen Atomic layer deposition Doping Supercapacitors Plasma measurements Capacitance Surface treatment Plasma applications Glow discharges Surface discharges space charge electric double layer capacitor nitrogen doping |
| Content Type | Text |
| Resource Type | Article |
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