NDLI: Uniform Electron Field Emission from a Carbon-nanotube-based Cold Cathode with Micro-imprinted Microstructures

Content Provider	IEEE Xplore Digital Library
Author	Chung, M. Liao, J.S. Ho, H.F. Wang, S.C. Huang, B.R. Chang, Y.Y. Lai, S.W. Chiou, J.M. Weng, M.H. Tzeng, Y.
Copyright Year	2006
Description	Author affiliation: Dept. of Electron. Eng., Southern Taiwan Univ. of Technol., Tainan (Chung, M.; Liao, J.S.; Ho, H.F.)
Abstract	Carbon nanotube (CNT) is an excellent field emitter due to its small diameter (1-40 nm), high aspect ratio $(>10^{3}),$ and high theoretical current limit (~1 muA/SWNT). The applications like CNT-FED or HPM require uniform distribution of field emission current, low turn-on field, and high current density. However, macroscopic cathodes made from CNTs for CNT-FED and microwave devices have been shown to exhibit low emission site density $(10^{3}-10^{4}$ $sites/cm^{2})$ compared to CNT density $(10^{9}-10^{10}$ $/cm^{2}$ ), non-uniformity in emission sites distribution, and lower current density achievable than dispenser cathode. The non-uniformity of emission sites distribution is closely related to field screening effect at individual sites. Only the CNTs with the highest local electric field can emit current. The effect of field enhancement factor, which is a strong function of local microstructure and a result of manufacture method, is found to be the dominate factor in deciding field emission current characteristics, and its effects surpass the work function of CNT, or the types of CNTs. An artificial microstructure is designed to utilize electric field screening effect and enhance electric field penetration around every CNT site so that a similar level of enhanced local electric field can be assured in each pre-designated site. These microstructures can be made by FIB, photolithography, or a low-cost micro-imprint technique. CNTs are deposited onto the surface by electrophoresis method. MAGIC simulation indicates that an improved field uniformity and penetration can be achieved by such microstructures
Starting Page	166
Ending Page	169
File Size	2834581
Page Count	4
File Format	PDF
ISBN	142440018X
DOI	10.1109/MODSYM.2006.365208
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2006-05-14
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Electron emission Carbon nanotubes Cathodes Microstructure Current density Electrokinetics Industrial electronics Microelectronics Microwave devices Nanoscale devices PIC simulation carbon nanotube field emission electrophoresis micro-imprint
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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