NDLI: Carbon nanotube integrated on silicon tips for electron field emitter: tip apex patterning and emission characterization

Content Provider	IEEE Xplore Digital Library
Author	Ching Hsiang Tsai Phan Ngoc Minh Ono, T. Tuyen, L.T.T. Phan Hong Khoi Yuh Wen Lee Ching Yi Wu Esashi, M.
Copyright Year	2003
Description	Author affiliation: Ind. Technol. Res. Inst., Electron. Res. & Service Org., Hsinchu, Taiwan (Ching Hsiang Tsai)
Abstract	In this work, we developed a selective patterning and lift-off technique for synthesis and patterning of carbon nanotube (CNT) at the apex of a silicon tip. Purpose of this work is to improve the throughput and yield rate of forming CNT at the silicon tip as electron field emitters. The sharp silicon micro-tip were formed by an ICP-RIE dry etching and wet etching in a TMAH solution. After thermally oxidation at 950/spl deg/C and selective etching in a buffer-HF (BHF) solution, a sharp silicon tip was formed at the center of a small silicon oxide aperture. CNTs were entirely grown over the tip by a Hot Filament-Chemical Vapor Deposition (HF-CVD) using Fe as a catalyst. After removing of the sacrificial silicon oxide layer in the BHF solution, small size CNTs bundles were remained at the apex of the silicon tip. The emission properties of the grown individual and bundle CNT at the Si tip were measured, and compared with a single silicon tip. The threshold voltage of the individual CNT was found to be 4V//spl mu/m, that is 5 times lower than that of the silicon tip. Emission pattern of the bundle CNT/Si tip was observed using a phosphor anode screen (ZnO, Zn).
Sponsorship	IEEE Electron Devices Soc
Starting Page	770
Ending Page	773
File Size	327376
Page Count	4
File Format	PDF
ISBN	0780377311
DOI	10.1109/SENSOR.2003.1215587
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-06-08
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Carbon nanotubes Silicon Electron emission Throughput Dry etching Wet etching Oxidation Apertures Chemical vapor deposition Iron
Content Type	Text
Resource Type	Article

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