NDLI: Compensation of high-speed drift by Cu-CMP APC in continuous input of high-mix products

Content Provider	IEEE Xplore Digital Library
Author	Miyashita, N. Tamaki, K. Tsuchiyama, H. Uchida, N. Sakai, K. Yamamoto, K.
Copyright Year	2010
Description	Author affiliation: Renesas Electronics Corp., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan (Tsuchiyama, H.; Uchida, N.; Sakai, K.; Yamamoto, K.) \|\| Hitachi Ltd., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan (Miyashita, N.; Tamaki, K.)
Abstract	This paper presents a novel Cu-CMP APC that compensates the high-speed drift of thinning amount during the continuous input of high-mix products. Compensation is realized by estimating the polishing rate as the summation of the estimated standard drift and the amount of shift for each product group. A new algorithm in which the products with similar rates are systematically grouped has also been developed. Numerical simulations have demonstrated that application of the novel APC to SoC products reduced the 3σ of the thinning amount by 60.0%.
Starting Page	1
Ending Page	4
File Size	1565179
Page Count	4
File Format	PDF
ISBN	9781457703928
ISSN	1523553X
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-10-18
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	ISSM
Subject Keyword	Production Metrology
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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Compensation of high-speed drift by Cu-CMP APC in continuous input of high-mix products