NDLI: Nano-optical CVD and nanophotolithography using an optical near-field nonresonant to electronic transition

Content Provider	IEEE Xplore Digital Library
Author	Kawazoe, T. Kobayashi, K. Ohtsu, M.
Copyright Year	2003
Description	Author affiliation: ERATO Localized Photon Project, Japan Sci. & Technol. Corp., Tokyo, Japan (Kawazoe, T.; Kobayashi, K.)
Abstract	In near-field optical chemical vapor deposition (NFO-CVD), photo dissociation can take place under nonresonant conditions, i.e., with visible light, due to the inherent properties of the optical near field. We succeeded the deposition of the nanometric Zn dots 70 nm wide and 24 nm high by NFO-CVD using the metal-organic gas Zn(acac)/sub 2/, which is not usually used for conventional optical CVD due to its low optical activity. This technique makes it possible to use various light and gas sources to deposit a variety of nanometric materials. This peculiar photochemical reaction of an optical near field is not limited to optical CVD, but can be applied to general photochemical reactions. We demonstrate near-field photolithography using a 532 nm laser. The pattern fabricated on photoresist was 150 nm wide and 25 nm deep.
Sponsorship	IEEE Nanotechnol. Council IEEE Region 6 Western USA
Starting Page	561
Ending Page	564
File Size	402695
Page Count	4
File Format	PDF
ISBN	0780379764
DOI	10.1109/NANO.2003.1230972
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-08-12
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Optical harmonic generation Nonlinear optics Atom optics Zinc Photochemistry Chemical vapor deposition Lithography Gas lasers Optical microscopy Electron optics
Content Type	Text
Resource Type	Article

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