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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Akeyoshi, T. Shimizu, N. Osaka, J. Yamamoto, M. Ishibashi, T. Sano, K. Murata, K. Sano, E. |
| Copyright Year | 1998 |
| Description | Author affiliation: NTT Syst. Electron. Labs., Kanagawa, Japan (Akeyoshi, T.) |
| Abstract | An InP-based InGaAs/AlAs/InAs resonant tunneling diode (RTD) and a uni-traveling-carrier photodiode (UTC-PD) are monolithically integrated by the regrowth technique to utilize the excellent device characteristics of the RTD and the UTC-PD. The RTD structures are regrown by molecular beam epitaxy on the top of UTC-PD structures grown by metalorganic chemical vapor deposition. The characteristics of the regrown RTDs are almost the same as those of conventional RTDs grown on semi-insulating InP substrates. The UTC-PD provides a sufficient current drivability, shown by the responsivity of 0.27 A/W, along with a high-speed operation demonstrated by the -3-dB bandwidth of 80 GHz, even at the low bias voltage corresponding to the peak voltage of the RTD. A simple circuit configuration of an optoelectronic logic gate with two RTDs and one UTC-PD was fabricated. This optoelectronic logic gate exhibited proper delayed flip-flop operation of 40 gbit/s at 7.75 mW. These results suggest that a circuit using RTDs and a UTC-PD is suitable for the construction of ultrahigh-speed and low-power optoelectronic circuits. |
| Starting Page | 423 |
| Ending Page | 426 |
| File Size | 404860 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780342208 |
| ISSN | 10928669 |
| DOI | 10.1109/ICIPRM.1998.712493 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1998-05-11 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Logic gates Resonance Circuits Logic devices Indium gallium arsenide Resonant tunneling devices Diodes Photodiodes Molecular beam epitaxial growth Chemical vapor deposition |
| Content Type | Text |
| Resource Type | Article |
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