NDLI: Metrology standards for advanced semiconductor lithography referenced to atomic spacings and geometry

Content Provider	IEEE Xplore Digital Library
Author	Teague, E.C. Linholm, L.W. Cresswell, M.W. Penzes, W.B. Kramar, J.A. Scire, F.E. Villarrubia, J.S. Jun, J.S.
Copyright Year	1993
Description	Author affiliation: Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA (Teague, E.C.; Linholm, L.W.; Cresswell, M.W.; Penzes, W.B.; Kramar, J.A.; Scire, F.E.; Villarrubia, J.S.; Jun, J.S.)
Abstract	It is shown how the needs for calibrating the positional accuracy of features of an X-ray mask membrane or an optical reticle can be addressed by application of a high-accuracy coordinate metrology system known as the Molecular Measuring Machine (M-Cubed). Based on scanning tunneling microscopy and state-of-the-art heterodyne optical interferometry, the measurements of M-Cubed are referenced to fundamental standards of length and angle and with the atomic-resolution of its scanning tunneling microscope probe are validated against the interatomic spacings and geometry of single crystal surfaces. Through the use of a stable reference grid, serving as an intermediate calibration artifact, the positional accuracy of features on an X-ray mask membrane or an optical reticle can be referenced to fundamental standards of length and angle by means of the metrology system of M-Cubed.
Starting Page	213
Ending Page	217
File Size	465842
Page Count	5
File Format	PDF
ISBN	0780308573
DOI	10.1109/ICMTS.1993.292918
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1993-03-22
Publisher Place	Spain
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Metrology Lithography Optical microscopy Atom optics Optical interferometry Biomembranes Optical mixing Tunneling Atomic measurements Coordinate measuring machines
Content Type	Text
Resource Type	Article

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