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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Underwood, I. Stevenson, J.T.M. Calton, D.W. Gundlach, A.M. Vass, D.G. |
| Copyright Year | 1998 |
| Description | Author affiliation: Dept. of Electron. & Electr. Eng., Edinburgh Univ., UK (Underwood, I.) |
| Abstract | The reflective spatial light modulator (SLM) technology of ferroelectric liquid crystal (FLC) on a CMOS VLSI substrate is now relatively mature. In order to optimize the optical performance of such a SLM, the silicon backplane should exhibit the following properties the backplane should be optically flat, both globally (across the backplane) in order to minimize distortion introduced by reflection from its surface and locally (within a pixel) in order to minimize scattering the pixel mirrors should occupy as much of the pixel area as possible, with minimal gaps between mirrors, in order to maximize the amount of reflected light the SLM surface should be microscopically smooth in order to promote good alignment of the FLC molecules. To achieve this we have developed micromachining techniques which are applied (in various combinations) as a post-processing sequence to "fully" processed wafers from a silicon foundry (such as Alcatel-Mietec or Austria Mikro Systeme). The post processing techniques involve the deposition, polishing and patterning of both dielectric and metal layers on top of the "fully" processed wafer. |
| File Size | 312483 |
| File Format | |
| ISBN | 0780349539 |
| DOI | 10.1109/LEOSST.1998.689709 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1998-07-20 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Micromirrors Chemicals Optical modulation Optical distortion Optical scattering Backplanes Silicon Mirrors Optical microscopy CMOS technology |
| Content Type | Text |
| Resource Type | Article |
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