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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Chan-Wook Baik So Yeon Jun Ho Young Ahn Seogwoo Hong Joo Ho Lee Yongsung Kim Sang Hun Lee SeGi Yu Jong-Min Kim |
| Copyright Year | 2010 |
| Description | Author affiliation: Department of Physics, Hankuk University of Foreign Studies, Yongin 449-791, Korea (So Yeon Jun; SeGi Yu) || Samsung Advanced Institute of Technology, Yongin, Korea (Chan-Wook Baik; Ho Young Ahn; Seogwoo Hong; Joo Ho Lee; Yongsung Kim; Sang Hun Lee; Jong-Min Kim) |
| Abstract | Precise measurement on the RF return loss was performed for a microfabricated slow-wave structure. The interaction circuit was designed to operate at 100 GHz of W-band frequency. A deep reactive ion etching (DRIE) showed a good side-wall profile but inaccurately curved bottom surface. The result represents that the etch rate was strongly dependent on the mask-opening area, which caused a frequency shift of about 5%. |
| Starting Page | 1 |
| Ending Page | 1 |
| File Size | 569317 |
| Page Count | 1 |
| File Format | |
| ISBN | 9781424466559 |
| e-ISBN | 9781424466573 |
| DOI | 10.1109/ICIMW.2010.5612565 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-09-05 |
| Publisher Place | Italy |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Loss measurement Oscillators Integrated circuit modeling Atmospheric measurements Particle measurements Micromechanical devices Electromagnetic waveguides |
| Content Type | Text |
| Resource Type | Article |
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