NDLI: Thin film resonator technology

Content Provider	IEEE Xplore Digital Library
Author	Lakin, K.M.
Copyright Year	2003
Description	Author affiliation: TFR Technol. Inc., Bend, OR, USA (Lakin, K.M.)
Abstract	The thin film resonator technology has been under development for over forty years in one form or another. Although the basic approach is derived from the desire to reach higher frequencies than those readily achieved by thinning bulk crystals, there have always been competing technologies or fundamental material or processing problems that have impeded the development. Finally, a point was reached in the wireless market wherein competing technologies appeared unable to meet the demands of modern wireless applications and thin film approaches began to receive some emphasis. This paper will survey the thin film resonator technology. Every effort will be made to provide an objective analysis of the technology in relation to applications and competing technologies, and point out obstacles and promises, as known, for further technology advancement to high frequencies.
Sponsorship	IEEE Ultrasonics, Ferroelectrics, and Frequency Control Soc. Piezoelectric Devises Association
Starting Page	765
Ending Page	778
File Size	463839
Page Count	14
File Format	PDF
ISBN	0780376889
ISSN	10756787
DOI	10.1109/FREQ.2003.1275190
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-05-04
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Transistors Crystalline materials Piezoelectric films Surface acoustic wave devices Dielectric thin films Zinc oxide Delay lines Microwave frequencies Boundary conditions Microelectronics
Content Type	Text
Resource Type	Article

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