NDLI: Reactive sputtering DC magnetron-deposited TiO2 thin films intended for photoelectrolysis of water for hydrogen production

Content Provider	IEEE Xplore Digital Library
Author	Boukrouh, S. Kerdoud, D. Medjani, F. Segni, R. Kezai, T.
Copyright Year	2012
Description	Author affiliation: University Center of Mila, Mila, Algeria (Boukrouh, S.; Kerdoud, D.; Medjani, F.) \|\| University Mentouri of Constantine, Constantine, Algeria (Segni, R.) \|\| Catholic University of Louvain, (UCL), Belgium (Kezai, T.)
Abstract	Because of its photoelectrochemical properties, titanium dioxide is an attractive material in photoelectrolysis of water for hydrogen production. Magnetron sputtering is a common and practicable technique that has been used to deposit TiO2 thin films with homogeneous uniformity and reproducibility for various applications. This work deals with the growth of anatse titanium dioxide on indium tin oxide substrate using reactive sputtering DC magnetron method to use them in hydrogen production. In view of the influence of processing techniques on the TiO2 photoelectrochemical properties, the choice of the appropriate technique and the optimization of deposition parameters and thermal traitments must be suitable for efficient water splitting reactions into hydrogen and oxygen. Under the conditions of deposition, anatase TiO2 thin films were prepared and the effect of annealing temperature on their structural and optical properties was examined. The X-ray analyzes and Raman spectroscopy show that the TiO2 films with a thickness of 500 nm obtained after annealing at 350 and 450 °C for 60 min of time deposition in an ambient air are anatase phase. The crystallite size of the films is increased with increasing annealing temperature. The deposited TiO2 thin films have high transparency in the visible range and opaque in the UV region. The optical properties of the films are found to be closely related to the microstructure and crystallographic structure, which depend on the annealing temperature.
Starting Page	1
Ending Page	4
File Size	410144
Page Count	4
File Format	PDF
ISBN	9781467324403
e-ISBN	9781467324403
DOI	10.1109/REDEC.2012.6416705
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-11-28
Publisher Place	Lebanon
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Annealing TiO2 thin film Hydrogen Refractive index Solar energy Energy conversion Titanium Photoelectrolytic cell Optical films DC magnetron sputtering Sputtering Substrates
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in